Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy

R. I. Woodward, R. T. Murray, C. F. Phelan, R. E. P. de Oliveira, S. Li, G. Eda, C. J. S. de Matos: Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy. CLEO:2016, OSA Technical Digest, Optical Society of America, 2016, (Paper STu1R.3).

Abstract

Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.

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@conference{Woodward_cleo16_mos2,
title = {Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy},
author = {R. I. Woodward and R. T. Murray and C. F. Phelan and R. E. P. de Oliveira and S. Li and G. Eda and C. J. S. de Matos},
url = {https://www.riwoodward.com/publication_files/woodward_cleo_2016_mos2.pdf},
doi = {10.1364/CLEO_SI.2016.STu1R.3},
year  = {2016},
date = {2016-06-07},
booktitle = {CLEO:2016, OSA Technical Digest},
publisher = {Optical Society of America},
abstract = {Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.},
note = {Paper STu1R.3},
keywords = {MoS2},
pubstate = {published},
tppubtype = {conference}
}