Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy. CLEO:2016, OSA Technical Digest, Optical Society of America, 2016, (Paper STu1R.3).
Abstract
Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.
Links
- https://www.riwoodward.com/publication_files/woodward_cleo_2016_mos2.pdf
- doi:10.1364/CLEO_SI.2016.STu1R.3
BibTeX (Download)
@conference{Woodward_cleo16_mos2, title = {Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy}, author = {R. I. Woodward and R. T. Murray and C. F. Phelan and R. E. P. de Oliveira and S. Li and G. Eda and C. J. S. de Matos}, url = {https://www.riwoodward.com/publication_files/woodward_cleo_2016_mos2.pdf}, doi = {10.1364/CLEO_SI.2016.STu1R.3}, year = {2016}, date = {2016-06-07}, booktitle = {CLEO:2016, OSA Technical Digest}, publisher = {Optical Society of America}, abstract = {Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.}, note = {Paper STu1R.3}, keywords = {MoS2}, pubstate = {published}, tppubtype = {conference} }